N,N',N''-Trimethylbis(hexamethylene)triamine - CAS 86018-07-7
Catalog: |
BB037799 |
Product Name: |
N,N',N''-Trimethylbis(hexamethylene)triamine |
CAS: |
86018-07-7 |
Synonyms: |
N,N'-dimethyl-N'-[6-(methylamino)hexyl]hexane-1,6-diamine |
IUPAC Name: | N,N'-dimethyl-N'-[6-(methylamino)hexyl]hexane-1,6-diamine |
Description: | N,N',N''-Trimethylbis(hexamethylene)triamine (CAS# 86018-07-7) is a useful research chemical. |
Molecular Weight: | 257.46 |
Molecular Formula: | C15H35N3 |
Canonical SMILES: | CNCCCCCCN(C)CCCCCCNC |
InChI: | InChI=1S/C15H35N3/c1-16-12-8-4-6-10-14-18(3)15-11-7-5-9-13-17-2/h16-17H,4-15H2,1-3H3 |
InChI Key: | XFKPZJBVIVCMKS-UHFFFAOYSA-N |
Boiling Point: | 332.9 ℃ at 760 mmHg |
Density: | 0.857 g/mL at 25℃(lit.) |
MDL: | MFCD00037068 |
LogP: | 3.25960 |
GHS Hazard Statement: | H314 (100%): Causes severe skin burns and eye damage [Danger Skin corrosion/irritation] |
Precautionary Statement: | P260, P264, P280, P301+P330+P331, P303+P361+P353, P304+P340, P305+P351+P338, P310, P321, P363, P405, and P501 |
Signal Word: | Danger |
Publication Number | Title | Priority Date |
KR-20200091526-A | Method of forming mask pattern and method of manufacturing semiconductor device using the same | 20190122 |
US-2020234947-A1 | Method of forming mask pattern and method of fabricating semiconductor device using the same | 20190122 |
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JP-2020114902-A | Method for producing thermoplastic elastomer composition | 20190117 |
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Complexity: | 135 |
Compound Is Canonicalized: | Yes |
Covalently-Bonded Unit Count: | 1 |
Defined Atom Stereocenter Count: | 0 |
Defined Bond Stereocenter Count: | 0 |
Exact Mass: | 257.283098129 |
Formal Charge: | 0 |
Heavy Atom Count: | 18 |
Hydrogen Bond Acceptor Count: | 3 |
Hydrogen Bond Donor Count: | 2 |
Isotope Atom Count: | 0 |
Monoisotopic Mass: | 257.283098129 |
Rotatable Bond Count: | 14 |
Topological Polar Surface Area: | 27.3 Å2 |
Undefined Atom Stereocenter Count: | 0 |
Undefined Bond Stereocenter Count: | 0 |
XLogP3: | 2.3 |
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