N-Methyldipentylamine - CAS 76257-73-3
Catalog: |
BB059323 |
Product Name: |
N-Methyldipentylamine |
CAS: |
76257-73-3 |
Synonyms: |
Diamylmethylamine; N,N-Dipentyl-N-methylamine; N,N-Dipentylmethylamine |
IUPAC Name: | N-methyl-N-pentylpentan-1-amine |
Description: | N-Methyldipentylamine is used in preparation of biphenyl moiety-containing quaternary ammonium salts as antibacterial, antifungal, and antiprotozoa agents. |
Molecular Weight: | 171.32 |
Molecular Formula: | C11H25N |
Canonical SMILES: | CCCCCN(C)CCCCC |
InChI: | InChI=1S/C11H25N/c1-4-6-8-10-12(3)11-9-7-5-2/h4-11H2,1-3H3 |
InChI Key: | JJRDPNRWFSHHKJ-UHFFFAOYSA-N |
Solubility: | Chloroform (Slightly), Methanol (Slightly) |
Appearance: | Clear Colorless Oil |
Storage: | 4°C |
References: | Shibata, S., et al. PCT Int. Appl.,В WOВ 2002060856В A1В 20020808 (2002). |
GHS Hazard Statement: | H227 (100%): Combustible liquid [Warning Flammable liquids] |
Precautionary Statement: | P210, P260, P264, P280, P301+P330+P331, P302+P361+P354, P304+P340, P305+P354+P338, P316, P321, P363, P370+P378, P403, P405, and P501 |
Signal Word: | Danger |
Publication Number | Title | Priority Date |
JP-2022042970-A | Methods for Producing Compounds, Resins, Resist Compositions and Resist Patterns | 20200903 |
JP-2022041917-A | Method for manufacturing resist composition and resist pattern | 20200831 |
JP-2022036009-A | Resin manufacturing method, resin, resist composition and resist pattern manufacturing method | 20200820 |
JP-2022032981-A | Method for manufacturing resist composition and resist pattern | 20200811 |
JP-2022031162-A | Method for manufacturing resist composition and resist pattern | 20200806 |
JP-2022031155-A | Method for producing salt, acid generator, resist composition and resist pattern | 20200805 |
JP-2022031156-A | Method for producing salt, acid generator, resist composition and resist pattern | 20200805 |
JP-2022029431-A | Method for Producing Carboxylate, Carboxylic Acid Generator, Resin, Resist Composition and Resist Pattern | 20200804 |
JP-2022029432-A | Method for producing salt, acid generator, resin, resist composition and resist pattern | 20200804 |
JP-2022028612-A | Method for producing salt, acid generator, resin, resist composition and resist pattern | 20200803 |
Complexity: | 71.1 |
Compound Is Canonicalized: | Yes |
Covalently-Bonded Unit Count: | 1 |
Defined Atom Stereocenter Count: | 0 |
Defined Bond Stereocenter Count: | 0 |
Exact Mass: | 171.198699802 |
Formal Charge: | 0 |
Heavy Atom Count: | 12 |
Hydrogen Bond Acceptor Count: | 1 |
Hydrogen Bond Donor Count: | 0 |
Isotope Atom Count: | 0 |
Monoisotopic Mass: | 171.198699802 |
Rotatable Bond Count: | 8 |
Topological Polar Surface Area: | 3.2Ų |
Undefined Atom Stereocenter Count: | 0 |
Undefined Bond Stereocenter Count: | 0 |
XLogP3: | 3.8 |
Online Inquiry
Customer Support
Customer Centered
Related Functional Groups
Other Building Blocks
Customers Also Viewed
INDUSTRY LEADERS TRUST OUR PRODUCTS