6-Benzoyl-2-naphthol - CAS 52222-87-4

Name: 6-Benzoyl-2-naphthol
Brand: BOC Sciences
Rating: 5 (1 reviews)

Catalog:	BB027750
Product Name:	6-Benzoyl-2-naphthol
CAS:	52222-87-4
Synonyms:	(6-hydroxynaphthalen-2-yl)-phenylmethanone

Technical Data

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Computed Properties

IUPAC Name:	(6-hydroxynaphthalen-2-yl)-phenylmethanone
Description:	6-Benzoyl-2-naphthol (CAS# 52222-87-4 ) is a useful research chemical.
Molecular Weight:	248.28
Molecular Formula:	C17H12O2
Canonical SMILES:	C1=CC=C(C=C1)C(=O)C2=CC3=C(C=C2)C=C(C=C3)O
InChI:	InChI=1S/C17H12O2/c18-16-9-8-13-10-15(7-6-14(13)11-16)17(19)12-4-2-1-3-5-12/h1-11,18H
InChI Key:	MJKZGSBXCWNUHV-UHFFFAOYSA-N
Boiling Point:	453.8 °C at 760 mmHg
Density:	1.24 g/cm³
LogP:	3.77640

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Related Functional Groups

Carbonyl Compounds

[91125-43-8]C15H22O5S.Na
Sulfophenyl nonanoate sodium salt
[89908-23-6]C23H22N2O5
2-Propenoic acid, 2-(3',3'-dimethyl-6-nitrospiro[2H-1-benzopyran-2,2'-[2H]indol]-1'(3'H)-yl)ethyl ester
[5650-34-0]C9H8O2
Oxiran-2-yl(phenyl)methanone
[87-88-7]C6H2Cl2O4
Chloranilic acid
[1018141-88-2]C17H14N4O2
1-(2-Cyanoethyl)-3-methyl-6-phenyl-1H-pyrazolo[3,4-b]pyridine-4-carboxylic acid
[1035840-45-9]C14H16N2O4
1-(5-Methoxy-1,3-benzoxazol-2-yl)piperidine-3-carboxylic acid

GHS Hazard Statement:	H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation]
Precautionary Statement:	P261, P264, P271, P280, P302+P352, P304+P340, P305+P351+P338, P312, P321, P332+P313, P337+P313, P362, P403+P233, P405, and P501
Signal Word:	Warning

Publication Number	Title	Priority Date
US-10018911-B2	Chemically amplified resist material and resist pattern-forming method	20151109
KR-101730867-B1	Direct Oxidative Arylation of C(sp3)-H Bonds Adjacent to Oxygen of Ethers and Alcohols	20150831
KR-20170026843-A	Direct Oxidative Arylation of C(sp3)-H Bonds Adjacent to Oxygen of Ethers and Alcohols	20150831
US-2017052449-A1	Chemically amplified resist material, pattern-forming method, compound, and production method of compound	20150820
US-10025187-B2	Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting	20140221

Complexity:	319
Compound Is Canonicalized:	Yes
Covalently-Bonded Unit Count:	1
Defined Atom Stereocenter Count:	0
Defined Bond Stereocenter Count:	0
Exact Mass:	248.083729621
Formal Charge:	0
Heavy Atom Count:	19
Hydrogen Bond Acceptor Count:	2
Hydrogen Bond Donor Count:	1
Isotope Atom Count:	0
Monoisotopic Mass:	248.083729621
Rotatable Bond Count:	2
Topological Polar Surface Area:	37.3 Å²
Undefined Atom Stereocenter Count:	0
Undefined Bond Stereocenter Count:	0
XLogP3:	4.2