4-(Methylsulfanyl)thiophenol - CAS 1122-97-0
Catalog: |
BB002929 |
Product Name: |
4-(Methylsulfanyl)thiophenol |
CAS: |
1122-97-0 |
Synonyms: |
4-methylsulfanylbenzenethiol |
IUPAC Name: | 4-methylsulfanylbenzenethiol |
Description: | 4-(Methylsulfanyl)thiophenol (CAS# 1122-97-0) is a useful research chemical. |
Molecular Weight: | 156.27 |
Molecular Formula: | C7H8S2 |
Canonical SMILES: | CSC1=CC=C(C=C1)S |
InChI: | InChI=1S/C7H8S2/c1-9-7-4-2-6(8)3-5-7/h2-5,8H,1H3 |
InChI Key: | KYMOWQQIZINTJZ-UHFFFAOYSA-N |
Boiling Point: | 252.9 °C at 760 mmHg, 116-117 °C / 3 mmHg |
Density: | 1.16 g/cm3 |
Appearance: | Colorless to light yellow liquid |
Storage: | Inert atmosphere, Room Temperature |
MDL: | MFCD00082770 |
LogP: | 2.69720 |
GHS Hazard Statement: | H302 (11.63%): Harmful if swallowed [Warning Acute toxicity, oral] |
Precautionary Statement: | P261, P264, P270, P280, P285, P301+P312, P302+P352, P304+P341, P305+P351+P338, P321, P330, P332+P313, P337+P313, P342+P311, P362, and P501 |
Signal Word: | Danger |
Publication Number | Title | Priority Date |
WO-2021024925-A1 | Chemically amplified positive photosensitive resin composition, photosensitive dry film, production method for photosensitive dry film, production method for patterned resist film, and production method for compound, photo-acid generator, and nâ€"organosulfonyloxy compound | 20190802 |
WO-2020155595-A1 | Aerobic oxidation system containing sulfinic acid, sulfonic acid or derivatives thereof and photocatalytic oxidation method therefor | 20190201 |
US-2020209739-A1 | Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound | 20181227 |
US-2020150541-A1 | Method of forming resist pattern, resist composition and method of producing the same | 20181114 |
US-2019346765-A1 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article | 20180509 |
Complexity: | 75 |
Compound Is Canonicalized: | Yes |
Covalently-Bonded Unit Count: | 1 |
Defined Atom Stereocenter Count: | 0 |
Defined Bond Stereocenter Count: | 0 |
Exact Mass: | 156.00674260 |
Formal Charge: | 0 |
Heavy Atom Count: | 9 |
Hydrogen Bond Acceptor Count: | 2 |
Hydrogen Bond Donor Count: | 1 |
Isotope Atom Count: | 0 |
Monoisotopic Mass: | 156.00674260 |
Rotatable Bond Count: | 1 |
Topological Polar Surface Area: | 26.3 Å2 |
Undefined Atom Stereocenter Count: | 0 |
Undefined Bond Stereocenter Count: | 0 |
XLogP3: | 2.6 |
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