3-Amino-2-methylphenol - CAS 53222-92-7
Catalog: |
BB028089 |
Product Name: |
3-Amino-2-methylphenol |
CAS: |
53222-92-7 |
Synonyms: |
3-amino-2-methylphenol |
IUPAC Name: | 3-amino-2-methylphenol |
Description: | 3-Amino-2-methylphenol (CAS# 53222-92-7) is used in production of (Diimido)dicarboxylic Acid, Imide, Polyamic Acid, Polyamides, Polyesters, and Polyureas. |
Molecular Weight: | 123.15 |
Molecular Formula: | C7H9NO |
Canonical SMILES: | CC1=C(C=CC=C1O)N |
InChI: | InChI=1S/C7H9NO/c1-5-6(8)3-2-4-7(5)9/h2-4,9H,8H2,1H3 |
InChI Key: | FLROJJGKUKLCAE-UHFFFAOYSA-N |
Boiling Point: | 267.1 °C at 760 mmHg |
Melting Point: | 127-133 °C |
Purity: | 95 % |
Density: | 1.157 g/cm3 |
Appearance: | Deep green to reddish grey powder |
MDL: | MFCD00007787 |
LogP: | 1.86400 |
GHS Hazard Statement: | H315 (100%): Causes skin irritation [Warning Skin corrosion/irritation] |
Precautionary Statement: | P261, P264, P271, P280, P302+P352, P304+P340, P305+P351+P338, P312, P321, P332+P313, P337+P313, P362, P403+P233, P405, and P501 |
Signal Word: | Warning |
Publication Number | Title | Priority Date |
CN-112175182-A | Positive photosensitive polyesteramide resin and composition using same | 20200930 |
EP-3896114-A1 | Novel compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | 20200414 |
EP-3896521-A1 | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component | 20200414 |
US-2021317268-A1 | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component | 20200414 |
US-2021317270-A1 | Novel compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | 20200414 |
PMID | Publication Date | Title | Journal |
15962942 | 20050601 | Prediction of genotoxicity of chemical compounds by statistical learning methods | Chemical research in toxicology |
Complexity: | 94.9 |
Compound Is Canonicalized: | Yes |
Covalently-Bonded Unit Count: | 1 |
Defined Atom Stereocenter Count: | 0 |
Defined Bond Stereocenter Count: | 0 |
Exact Mass: | 123.068413911 |
Formal Charge: | 0 |
Heavy Atom Count: | 9 |
Hydrogen Bond Acceptor Count: | 2 |
Hydrogen Bond Donor Count: | 2 |
Isotope Atom Count: | 0 |
Monoisotopic Mass: | 123.068413911 |
Rotatable Bond Count: | 0 |
Topological Polar Surface Area: | 46.2 Å2 |
Undefined Atom Stereocenter Count: | 0 |
Undefined Bond Stereocenter Count: | 0 |
XLogP3: | 1.3 |
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